喷涂硅靶材/粉体 高纯4~6N 电子玻璃喷涂靶材 可定制

喷涂硅靶材  Spray Si Target

产品说明Product description

以等离子体为热源，在真空环境，或负压氮气或氩气保护环境下将Si粉末加热到熔融或半熔融状态并高速冲击背管表面形成致密涂层，从而制备出高纯度、低氧含量、高致密度Si靶材。 

With plasma as the heat source, high purity, low oxygen content, high density Si targets are produced from Si powder. The Si powder is heated to molten or semi-molten state in vacuum or at a negative pressure of nitrogen (N2) or argon (Ar) and deposited on the surface of backing tube at high speed to form dense coatings.

产品特点Products feature

项目 Item	参数 Specifications	检测手段 Testing method
纯度Purity（Si+B）	≥ 99.99%
密度Density	≥2.2 g/cm3	阿基米德密度仪 Archimedes densimeter
杂质含量Inclusions	Fe +Al+Ca: ≤50 ppm B: ≤100 ppm O: ≤2000 ppm N: ≤500 ppm 杂质总和(O、N、B除外): ≤100 ppm Total impurity (excluding O, N, B ): ≤100 ppm	ICP
电阻率  Electrical resistivity	≤10Ω·cm	四探针电阻率仪 Four probe resistivity meter

 

背管材质 Backing tube

-选用304/316L不锈钢（无磁）。

304/316L stainless steel (non-magnetic).

 

靶材尺寸Dimension

-按照图纸要求加工 

According to customized drawings.

 

应用领域Applications

-用于制作SiO2/Si3N4膜，主要用于光学玻璃，触摸屏之AR膜系，Low-E镀膜玻璃，半导体电子，平面显示，触摸屏。

For deposition of SiO2/Si3N4 films, for optical glasses, AR films of touch panel screens, Low-E glasses, semiconductor devices and flat panel screens.